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Abstract. Topography simulations allow for a visualization of semiconductor surfaces as well as the interfaces between various material regions after a given processing step. Topography modeling of well-established processing techniques, such as material etching and deposition, has been studied for decades and very sophisticated models exist.
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Kurzfassung: Kurzfassung (englisch) This cumulative doctoral thesis includes three articles that examine different aspects of the relationship between intellectual property (IP) protection and economic development. The first article reviews the impact of IP protection on foreign direct investment (FDI) by multinational enterprises (MNEs) in developing countries. Applying different panel data.
Next: Kurzfassung Up: Dissertation Alexandre Nentchev Previous: Dissertation Alexandre Nentchev Contents Abstract. Modeling and simulation are a crucial aid for reducing development cycle time and costs in modern semiconductor technology. New modeling concepts increasingly require long-term research performed in an interdisciplinary manner, and.
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